Compact-2D: A Physical Design Methodology to Build Two-Tier Gate-Level 3-D ICs

Abstract

The recent advancement of wafer bonding and monolithic integration technology offers fine-grained 3-D interconnections to face-to-face (F2F) and monolithic 3-D (M3D) ICs. In this article, we propose a full-chip RTL-to-GDSII physical design solution to build commercial-quality two-tier gate-level F2F and M3D ICs. The state-of-the-art flow named shrunk-2D (S2D) requires shrinking of standard cells and interconnects by a factor of 50% to fit into the target 3-D footprint of a two-tier design. This, unfortunately, necessitates commercial place/route engines that handle one node smaller geometries, which can be challenging and costly. Our flow named compact-2D (C2D) does not require any geometry shrinking. Instead, C2D implements a 2-D IC with scaled interconnect $RC$ parasitics and contracts the layout to the 3-D integrated circuit footprint. In addition, C2D offers post-tier-partitioning optimization (post-TP opt) which is completely missing in S2D. This additional optimization step is shown to be effective in fixing timing violations caused by intertier 3-D routing overhead. Lastly, we present a methodology to reuse the routing result of post-TP opt for the final GDSII generation. Our experimental results show that at iso-performance, C2D offers up to 28.0% power reduction and 15.6% silicon area savings over commercial 2-D ICs without any routing resource overhead.