Combined Auger Electron Spectroscopy and Electron Impact Desorption Studies of the Interactions of Gases with Silicon Surfaces

Abstract

The interactions at room temperature of O2, H2O, NO and NH3 with thermally cleaned Si(111) surfaces have been investigated using the combined Auger electron spectroscopy and electron impact desorption techniques. The Auger yields and the electron impact desorption are related to the structural models of the adsorption complexes. The ion species observed by electron bombardment are O+ ions from Si(111)–O2, H+ and O+ ions from Si(111)–H2O, and O+ ions from Si(111)–NO systems. The energy distributions of these ions, and the adsorption kinetics measurements monitored by the ion currents are presented and discussed.