Abstract
The present author and coworkers have developed a method of coating film formation by vapor deposition and simultaneous bombardment of ions with the energy 2–40 keV (dynamic mixing or IVD method) and prepared TiN, BN and MoN films. Advantages of this method are as follows: quick preparation of films by high current ion beams, strong adhesion between film and substrate, preparation of thick coating films with few microns, preparation at low temperature and easy control on composition. In almost all cases, films consist of crystallines with a definite preferred orientation. In the present report, the method of film preparation and properties of produced films are reviewed.
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