Abstract
The chemical reactivity of Al-Cl and Cl-Si atoms has been studied by in-situ scanning tunneling microscopy (STM). Cl atoms are first adsorbed at room temperature on a Si(111)7×7 surface in an ultra-high vacuum STM. Next, Al atoms are evaporated on this surface. As a result, the Al atoms desorb the Cl atoms from the Si surface, because Cl atoms react more strongly with Al atoms than with Si adatoms.
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