Abstract
In this paper, the interaction between the tungsten surface and the oxidizer was discussed by potentiodynamic polarization test in order to compare the chemical mechanical polishing (CMP) performances and electrochemical behavior of the tungsten film as a function of mixed oxidizers. The potentiodynamic polarization results indicated that the corrosion current densities of 5 wt.% Fe(NO3)3+5 wt.% H2O2 were higher than the other mixed oxidizers. Such an electrochemical corrosion effect implies that slurries with the highest removal rate (RR) have high dissolution rate.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
