Abstract
Titanium oxide films have been deposited on glass substrates (50 × 20 mm 2) and on (100) silicon wafers (10 × 10 mm 2) by r.f. reactive magnetron sputtering from a 99.6% pure titanium target. The microstructure of these films has been characterized by atomic force microscopy. Optical properties have been measured using optical transmission UV-vis spectrum and colour measurements have been carried out in the CIELAB system of colorimetry. The effects of the oxygen partial pressure and the total sputtering pressure on the surface morphology, optical and electrical properties have been investigated and the stoichiometry of the layers has been determined by Rutherford backscattering spectroscopy measurements. The experimental results indicate an increase of layers' density with the oxygen partial pressure and a decrease of this density with the total pressure.
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