Abstract
Yb-doped titanium dioxide (TiO2) films deposited on glass substrate were prepared by radio-frequency (RF) magnetron sputtering. The effects of total sputtering pressure and Yb doping on the phase structure, surface morphology, surface roughness and optical properties of TiO2 films were investigated. The results showed that all of Yb-doped TiO2 films deposited under pure Ar and Ar/O2 gas mixture at substrate heating temperature 500°C consisted of well crystalline anatase. It was demonstrated that the surface morphology and roughness of deposited films were strongly affected by the total sputtering pressure. The film sputtered under higher pressure (3Pa) has higher surface roughness with porous structure. Moreover, the increasing in surface roughness of deposited films when doping with Yb was observed. The absorption edge of transmittance of Yb-doped TiO2 film was red-shifted compared to the pure TiO2 film.
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