Abstract
The normal and diffuse reflectivity from a resist/aluminum system were measured with various resist thicknesses. The average surface roughness σ a of aluminum surfaces varied from 5.5 to 10.5 nm upon changing the sputtering conditions. The diffuse reflectivity at the air/aluminum interface increases with surface roughness. This tendency is enhanced as the wavelength of incident light decreases. The interference effect for the resist/aluminum system decreases as the surface roughness increases. This tendency is enhanced when the resist absorptivity decreased. These results are analyzed with using the help of the “Swing” model.
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