Abstract

Semiconductor nuclear radiation detectors made from tertiary and quaternary compounds of cadmium telluride (CdTe) can operate at room temperature without cryogenic cooling. One of such materials that have become of great interest is cadmium zinc telluride selenide (CdZnTeSe). Compared to other CdTe-based materials, such as cadmium zinc telluride (CdZnTe), CdZnTeSe can be grown with much less Te inclusions and sub-grain boundary networks. Chemical etching is often used to smoothen wafer surfaces during detector fabrication. This paper presents the characterization of CdZnTeSe that is chemically etched using bromine methanol solution. Infrared imaging shows that the wafer has no sub-grain boundary networks that often limit detector performance. The current-voltage (I-V) characterization experiment gave a resistivity of 4.6 × 1010 Ω-cm for the sample. The I-V curve was linear in the ±10 to ±50 volts range. An energy resolution of 7.2% was recorded at 100 V for the 59.6-keV gamma line of 241Am.

Highlights

  • Compared to other cadmium telluride (CdTe)-based materials, such as cadmium zinc telluride (CdZnTe), CdZnTeSe can be grown with much less Te inclusions and sub-grain boundary networks

  • This paper presents the characterization of CdZnTeSe that is chemically etched using bromine methanol solution

  • We present the characterization of CdZnTeSe that is chemically etched using bromine methanol solution

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Summary

Introduction

Efforts in the development of room-temperature semiconductor nuclear detectors include mercuric iodide (HgI2), cadmium telluride (CdTe), cadmium zinc telluride (CdZnTe or CZT), and thallium bromide (TlBr) [2] [3] [4] [5] [6]. Among these materials, CdZnTe has been widely accepted due to its ability for high-resolution nuclear detection at room temperature without cryogenic cooling. We present the characterization of CdZnTeSe that is chemically etched using bromine methanol solution

CdZnTeSe Material
Cutting of Detector Wafer
Surface Polishing
Chemical Etching
Surface Passivation
Deposition of Electrical Contacts
Infrared Transmission Imaging
Current-Voltage Measurements
Detector Response Characterization
Findings
Conclusion
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