Abstract
Boron carbon nitride (BCN) shows promise as a field emitter material because of its mechanical hardness, chemical inertness, and low electron affinity. This study investigated the modification of a BCN film with an amorphous area using KrF excimer laser (wavelength: 248 nm, photon energy: 5.0 eV) annealing without substrate heating. This achieved significant variation in characteristics, such as an increase in bandgap energy and decrease in electron affinity. Laser annealing reduced electron affinity from 0.7 to 0.3 eV. The results indicate that the modification of the BCN film by KrF excimer laser annealing achieves characteristics similar to hexagonal BN (h-BN) film without losing the desirable properties of the BCN film, such as physical stability.
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