Abstract
Thin and thick film coatings are key technologies for developing high-performance materials. In general, metals have good mechanical properties such as high strength and ductility, whereas ceramics have high hardness and good corrosion resistance as well as various functionalities such as thermal insulation and bioactivity. Because surface characteristics often determine the functionality of materials, surface modification by film coating is a versatile technique for developing multifunctional materials. Among various coating techniques, a dry process using either a vacuum, that is, physical vapor deposition (PVD), or a reduced atmosphere, that is, chemical vapor deposition (CVD), is advantageous for the preparation of high-purity, defect-free, and well-adhered coatings. CVD, in particular, can be used to prepare films with good conformal coverage and high thermal stability compared with PVD. It has also been considered as a thin film coating process, because the deposition rates of CVD are commonly less than several tens of micrometers per hour. Further, thick film coating is not well developed compared with thin film coating; however, thick film coating has many applications such as thermal barrier, anticorrosion, and antiabrasive coatings.
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