Abstract
Rapid thermal processing (RTP) based on incoherent light as a source of energy has emerged as an alternate of furnace processing. In recent years, we have demonstrated that in addition to the high heating and cooling rates, quantum photoeffects play an important role in the operation of RTP. The quantum photoeffects can be fully exploited by using an incoherent light source as the source of optical energy (photons with wavelength less than 800 nm) and tungsten halogen lamps as the source of optical and thermal energy. The use of ultra violet (UV) or vacuum ultra violet (VUV) photons along with infrared photons is referred to as rapid photothermal processing (RPP). This paper addresses the issues involved as we move from RTP to RPP. The improved device performance results of diffusion, chemical vapor deposition (CVD), ohmic contact formation and metallization are described in detail. The manufacturing issues like stress, defects, reliability and yield are discussed in the context of RPP and the paper presents potential advantage of RPP for the manufacturing of microelectronics, solar cells, flat panel display and optoelectronics.
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