Carrier lifetime increase in silicon by gettering with a MeV-implanted carbon-rich layer

Abstract

The gettering efficiency of silicon implanted with carbon ions in the energy range 0.33–10 MeV was tested by carrier lifetime measurements. After an intentional contamination of the sample back side with gold as a lifetime killer, we found values for the generation lifetime of the minority carriers on the front side higher by 1–2 orders of magnitude as compared with unimplanted silicon.