Abstract
The microwave plasma chemical vapor deposition (MPCVD) method is capable of synthesizing various forms of carbon allotropes such as diamond, carbon nanotubes (CNTs), and diamondlike carbon (DLC) while varying the growth parameters or utilizing substrate coated with catalytic thin film. In this article, needlelike carbon nanostructures (CNs) were synthesized utilizing high power (5kW) and high working pressure (120Torr) MPCVD on a thin catalytic film of nickel with a diffusion barrier layer of titanium on a micropatterned silicon substrate. The effects of in situ doping by trimethylboron (TMB) on the morphologies and field emission properties of the CNs were also investigated. Straight, needlelike CNs with random orientation were obtained for 15min growth time with or without TMB doping. However, the CNs appear to transform into diamondlike nanocrystals after prolonged growth of 30min with TMB doping. Unlike MPCVD grown CNTs, it was found that the CNs have strong adhesion to the substrate and could withstand postgrowth processing such as ultrasonic agitation cleaning in solvents. Field emission tests performed show that in situ TMB doping of the patterned needlelike CNs lowers the turn-on field of the cathode. A vacuum field emission triode with self-aligned gate utilizing CNs as the field emitter is also fabricated.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
