Abstract
The conventional Cabrera–Mott model for describing the kinetics of growth of thin oxide films on metal crystals is based on the assumption that the process is limited by the field-facilitated activated jumps of metal ions on the flat metal-oxide interface. We modify this model in order to apply it to nm-sized metal particles. Our analysis indicates that due to the difference in the distribution of the electric field the kinetics of oxidation of nm-sized particles may be much faster compared to those of macroscopic samples.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
