Bumping Co-planarity Collocation for Different UBM Size by Geometry Integration

Abstract

Abstract Bumping co-planarity is a Cu pillar bump characteristic, that can impact to the joint quality of subsequent flip chip bonding process. The plated bump height variation correlates with lesser co-planarity values. Co-planarity can be minimized by bumping process, however the bumping process window is not adequate for some design features. For example, dummy bump or structure drawback features. This paper provides a methodology to improve co-planarity by collocating oval and circular bump which integrates the solder volume of different bump shapes. The final solder formation is different due to the geometry variation from the oval shape and circular shape. The final solder height can be calculated by mathematical integral from as-plated solder volume. Hence, better co-planarity can be achieved by the proposed method to collocate different bump shapes. The Cu pillar bump collocation design rules can be optimized to minimize co-planarity during initial design realization to minimize quality risks during fabrication..