Abstract
Boron nitride coatings were deposited by reactive pulsed magnetron sputtering of B and BN targets (50 kHz, 10 µs for B; 13.56 MHz for BN) at 2–20 mA/cm2 ion current density on the substrate. The effect of electron beam generated plasma on characteristics of magnetron discharge and phase composition of coatings was studied.
Highlights
IntroductionBoron nitride (BN) coatings have been used in various fields of science and technique due to their unique features
Boron nitride coatings were deposited by reactive pulsed magnetron sputtering of B and BN targets (50 kHz, 10 μs for B; 13.56 MHz for BN) at 2–20 mА/cm2 ion current density on the substrate
Boron nitride (BN) coatings have been used in various fields of science and technique due to their unique features
Summary
Boron nitride (BN) coatings have been used in various fields of science and technique due to their unique features It is known there are several polymorphic modifications of BN, including superhard (up to 72 GPа) cubic с-BN phase [1]. Intensive ion assistance is a necessary condition for deposition of coating with high с-BN content by vacuum-plasma methods. To increase the ion current density during BN coating deposition by magnetron sputtering, unbalanced magnetic field [5] or ion-beam assistance are often used [6]. The aim of the work is the study of the effect of ion component of electron beam plasma on the characteristics of magnetron discharge with B and h-BN targets and on the phase composition of coatings.
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