Abstract
Silicon-rich oxide (SRO) films doped with tin (Sn-SRO) were successfully deposited using hot filament chemical vapor deposition (HFCVD), with tin-doped SBA-15 as the solid source material. SBA-15 acted as a protective layer, ensuring thermal stability and enabling the controlled incorporation of tin into the SRO films. Structural and optical analyses, including Fourier- transform infrared spectroscopy (FTIR), transmission electron microscopy (TEM), and photoluminescence (PL), were performed to evaluate the films. FTIR revealed SiO2 absorption peaks and Si-O-Sn bond formation, confirming the progressive incorporation of tin. TEM demonstrated the formation of silicon nanocrystals (Si-NCs), with decreasing size as tin concentration increased. This size reduction was correlated with enhanced PL intensity and a blue shift, attributed to stronger quantum confinement effects. These analyses provide a comprehensive understanding of the structural and optical behavior of Sn-doped SRO films. These findings highlight the potential of Sn-SRO films for optoelectronic applications, where controlling light emission and crystallinity is essential.
Published Version
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