Abstract
The formation of a nanocomposite structure is thermodynamically driven by spinodal decomposition in at least two phases. With respect to the suppression of solid solution formation, artificial nc-TiN/nc-CrN composites were deposited using a novel hybrid-process, in which TiN nanoparticles and CrN thin film were separately synthesized and simultaneously deposited during composite growth. The bias-voltage is known as a crucial deposition parameter concerning the structural and mechanical properties in thin film technology. However, it is still unclear whether an externally injected nanoparticle jet is influenced by the bias-voltage applied to the substrate. In this work, composite thin films were DC sputtered applying bias-voltages of 0 V, -100 V and -200 V in DC mode, as well as -100 V in MF and HiPIMS mode. TEM-investigations reveal the successful embedment of the nanoparticles in the film. Growth defects in the interface between nanoparticle and thin film can be reduced using a pulsed bias-voltage. Based on 2D GI-XRD experiments using synchrotron radiation, a bias-voltage of -200 V DC and -100 V MF enables the reinforcement of a higher nanoparticle content in the thin films. Similar to an increased bias-voltage, the injection of nanoparticles results in a decrease of the crystallite size. In principle, the residual stresses are increased by the nanoparticle embedding, as is the case for an increasing bias-voltage. In the event of a pulsed-bias voltage, however, the residual stresses can be reduced by the embedding of the nanoparticles. The mechanical properties of the CrN thin films can be maintained when nanoparticles are injected.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have