Abstract
Ultraviolet (UV) irradiation can cause a severe damage to textiles, such as color fading, polymer degradation, and mechanical strength decrease. The aim of this study was to deposit inorganic UV blocking agents onto polyamide/aramid dyed fabric using atomic layer deposition (ALD) technique to produce functional fabrics that are resistant to high intensity UV light. Scanning electron microscopy (coupled to energy‐dispersive spectroscopy), X‐ray photoelectron spectroscopy, and thermogravimetry studies demonstrated that TiO2, Al2O3, and TiO2/Al2O3 nanolayer could be successfully deposited onto the fiber surface. The dyed fabrics with different ALD coatings showed excellent high intensity UV resistance and were also more resistant to high intensity UV‐induced mechanical strength damage. These results suggested that the ALD technology could be effective technique to improve the properties of dyed fabrics. POLYM. ENG. SCI., 55:1296–1302, 2015. © 2015 Society of Plastics Engineers
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
