Abstract
In this paper, a 2D analytical model for the Dual Material Surrounding Gate MOSFET (DMSG) by solving the Poisson equation has been proposed and verified using ATLAS TCAD device simulator. Analytical modeling of parameters like threshold voltage, surface potential and Electric field distribution is developed using parabolic approximation method. A comparative study of the SCEs for DMSG and SMSG device structures of same dimensions has been carried out. Result reveals that DMSG MOSFET provides higher efficacy to prevent short-channel effects (SCEs) as compared to a conventional SMSG MOSFET due to the presence of the perceivable step in the surface potential profile which effectively screen the drain potential variation in the source side of the channel. A nice agreement between the results obtained from the model and the results obtained from numerical TCAD device simulator provides the validity and correctness of the developed model.
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