Abstract
Theoretical study using mathematical analysis supported by Matlab code was created, for Silicon dioxide (SiO<sub>2</sub>) thin films on various substrate materials (Aluminium, quartz, and silicon), and different thicknesses. Reflectance and transmittance of the (SiO<sub>2</sub>) thin film is strongly dependent on the electromagnetic wavelength. Many physical results were obtained. The results obtained serve as an illustration of the feasibility of simple techniques in measuring precisely the reflectance and absorptance of the (SiO<sub>2</sub>) thin film with an error not exceeding 0.1%. The reflectance and absorptance characteristics of multilayer thin film are strongly dependent on the wavelength of the electromagnetic waves. The effects of various substrate materials on the reflectance characteristics have been investigated by evaluating the reflectance curves of SiO<sub>2</sub> thin films with thickness in the range of (100-1000) nm. The amplitude and periodicity of reflectance and absorptance changed with wavelength. Also the periodicity of this variety change with the film thickness and with the substrate material. In multilayer thin-film devices, the amount of light reflected at each interface can be adjusted by adjusting many factors like film thickness and substrate materials. beams phase can be adjusted by changing the layer thickness. There are thus two parameters associated with each layer, thickness and refractive index difference between film and substrate materials, which can be chosen to give the required performance.
Highlights
Silicon oxide ( ) Thin films are the most extensively studied among different deposited materials
In the electronics industry, ( ) films have an important use as the gate oxide in the semiconductor and electronic devices [5], another important use in protective layers of magnetic or optical disks and in coatings of displays [6]
In order to exam the optical properties of a thin film, a mathematical Matlab code was built to exam the films with a thickness range from 50 − 1000, using a wavelength in the range 200 − 1000 from near IRvisible –near UV
Summary
Silicon oxide ( ) Thin films are the most extensively studied among different deposited materials. Because of their technological importance as dielectric protective layers in semiconductor layers, integrated circuits, waveguides, and many other applications. There is an urgent need to obtain controlled data for optical constants for materials that are used as a thin film in terms of wavelength. Since these constants can be determined only within a very narrow wavelength range, the proposed structures for such materials need to be tested with more rapid and more accurate theoretical simulation methods. The optical transmission and reflectance spectra for a range of samples of ( ) thin films (of different thickness) were obtained by a Matlab code
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
