Abstract
Charging phenomena of polymer films on silicon substrates under electron beam irradiation are studied by numerical simulation. The initial distribution of the charge deposited in the sample is calculated by a Monte Carlo simulation of electron scattering, and charge drift is simulated by taking into account the Poisson equation, the charge continuity equation, Ohm's law, and electron beam induced conductivity. The dependences of charging on electron energy and polymer thickness are explained by the secondary yield and the relationship between the electron range and polymer film thickness.
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