Abstract
The effects of plasma bombardment variations at the substrate surface in low frequency (380 kHz) r.f. glow discharges, as used in some r.f. plasma-assisted physical vapour deposition processes, was investigated by means of a sputter weight loss technique. Experiments were performed at a range of argon pressures and powder densities and the results compared with previously published work. It was found that the bombardment variations in the r.f. discharges were very similar to those observed in d.c. diodes, with a small additional contribution attributed to electron emission from the chamber walls which is thought to cause bombardment changes as a result of creating additional ions in the vicinity of the walls. The work is of significance in coating and plasma treatment applications because of the profound effects ion bombardment has, for example, on coating thickness uniformity, coating structure and diffusional effects.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
