Plasma assisted deposition techniques and synthesis of novel materials

Abstract

Various industrial applications have been found for plasma assisted deposition processes in the synthesis of a variety of compound films. These include dielectric, metallic and semiconducting films for microelectronics, optics and optoelectronics, as well as hard carbides and nitrides for cutting and forming tools, sulfides for solid lubricants and solid state batteries, etc. The uniqueness of plasma assisted deposition processes lies in their ability to synthesize complex films at relatively low substrate temperatures. These processes enable film properties to be varied over a wide range by control of the plasma conditions e.g. electron density, energy and distribution function. Therefore, plasma assisted deposition processes have attracted a great deal of interest in recent years. We present a review of plasma assisted deposition techniques currently used in industry, in terms of their potential and their limitations for synthesis of novel materials such as diamond, cubic boron nitride, etc. Results of experimental work in our laboratory are also discussed.