An improved ion assisted deposition technology for the 21st century

Abstract

In recent years technologies based on physical and chemical vapour deposition (PVD and CVD) have had a significant impact on the performance of a range of products including cutting tools, aircraft and automotive parts, decorative and electronic products. However, it is envisaged that further improvements in material properties and hence improved product performance will only be likely if these processes are modified to incorporate ion assistance. Preliminary results have shown that adhesion, hardness, structural, optical and electrical properties of the deposited coatings improve when ion-assisted deposition is used instead of conventional PVD and CVD technologies. The major general improvements are lower deposition temperatures and higher deposition rates, opening up many new applications previously considered outside the realm of this technology. As examples, to illustrate the improved technology, the deposition of Cd, Al, W, diamond-like carbon and TiN are considered in detail in relation to applications in industry. The relationships between the process parameters and the coating characteristics were also investigated. This process can be easily automated, is suitable for production use and is likely to produce a profound effect on manufacturing in the 21st century.