Abstract
Diamond-like carbon (DLC) films are known for their high mechanical hardness, high wear resistance, low friction coefficients, optical transparency, electrical resistivities, besides, have extensively applications in many areas such as the electronic devices, high precise mechanisms, etc. Even though the incorporation of fluorine into DLC films will reduce their surface energy, don’t change their original excellent properties. The hydrophobic characteristics attach DLC films superior properties can be used in nonstick kitchenware and protective coatings for optical instruments. The feathers of DLC films are defined by the method of production. The key point of DLC is the fraction of sp3 bonding, and it’s decided by ion energy. Via former reports, we have already know many different production process of causing different ion energy, such as direct dual ion beam deposition(DDIBD), plasma-based ion implantation (PBII), plasma-enhanced chemical vapor deposition (PECVD), filtered cathodic arc plasma system (FCAP) and others. Filtered cathodic vacuum arc plasma system is a developed technology for depositing amorphous DLC films, It has the advantages of a high deposition rate and low deposition temperature. The cathodic arc can guarantee a good diamond-like film quality by generating highly ionized plasma (30–100%).There is a magnetic filter before the substrate, it can removes the neutrals and macro-particles that are produced by bombarding the carbon target. This relationships between various bias voltage and CF4 flow rate of the a-C:F films were explored in this research.
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