Abstract
With the increasing demand for surface processing, there has been a growing interest in enhancing the performance of cerium oxide (CeO2) abrasives for glass chemical mechanical polishing (CMP). To enhance the CeO2 abrasives’ CMP performance, we use the surface modification method to combine inorganic CeO2 with organic ethylenediaminetetraacetic acid (EDTA) molecules, thus utilizing the chemical reaction activity of organic substances to raise the chemical reaction between CeO2 and glass. A series of ethylenediaminetetraacetic acid grafted cerium oxide (CeO2-EDTA) composite abrasives were synthesized and characterized. The CMP experiment indicates that CeO2-EDTA with the EDTA content of 8.33 wt%, called CeO2-EDTA(8.33 %), had a splendid polishing performance. Compared with CeO2, the material removal rate of CeO2-EDTA(8.33 %) could be increased by about 40 % while the surface quality concurrently ameliorated. X-ray photoelectron spectroscopy analysis, dynamic friction test, and contact angle test were further used to probe the removal mechanism of composite abrasives. As a result, the correlation between MRR value and the concentration of cerium trivalent ion, particle size, dynamic friction coefficient, and contact angle was found. This provides a reference for the modification of cerium oxide in the future.
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