Abstract
Amorphous and amorphous-crystalline stainless steel films were obtained with additions of Ti or W. The deposition rate was v = 6–630 nmmin−1, the thickness h = 50 to 5000 nm and the substrate temperature Ts varied from 77 to 293 K. A magnetron compound target was used for sputtering and coatings were deposited on Al, steel, glass-ceramic and Corning glass substrates. Structural data for the coexistence of amorphous and amorphous-crystalline phases in stainless steel films are presented. A study was made of the structure sensitive properties: specific electrical resistivity and magnetic characteristics. Some data were obtained for films Fe + Ti and Fe + W, prepared by the same method. Properties affecting the practical application of such amorphous and amorphous-crystalline metal coatings were also studied.
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