Abstract
A series of 150-nm-thick Al-doped ZnO (AZO) thin films with various Al doping concentrations were deposited by atomic layer deposition technique to determine their applicability in transparent electronic devices. For incorporation into transparent electrodes, the electrical properties of AZO films must be modulated to minimize the parasitic effect. The results show that AZO thin films with various Al dopant concentrations had different work-functions and electrical contact properties, while the other physical characteristics were not significantly changed. Hence, AZO thin films can be used as transparent conducting oxide materials and are potential alternatives for the currently used indium-tin-oxide (ITO) thin films.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call