Aerosol and plasma assisted chemical vapor deposition process for multi-component oxide La0.8Sr0.2MnO3 thin film

Abstract

It has been of increasing interest to develop a chemical vapor deposition (CVD) process to prepare thin films of multi-component oxides, such as fluorite and perovskite type materials, which exhibit unique functional properties and potential applications. The lack of the proper volatile precursors and the difficulty in composition control are the major barriers to sluggish the achievement of this purpose. Recently, we developed an aerosol assisted CVD method to deposit perovskite-type oxide La1−xSrxMnO3, a mixed oxygen ion/electron conductor. Furthermore, microwave plasma activation to the aerosol phase is applied to promote the deposition process. This paper reports briefly the preliminary results from this novel technique.