Abstract
The adsorption of Hf deposited from vapor in ultra-high vacuum onto thermally cleaned surfaces of W has been studied using field electron emission microscopy. Three-dimensional nucleation and two-dimensional layer formation on structurally and topographically different areas of the substrate were observed for various annealing temperatures and various amounts of the deposited adsorbate. The dependence of the average work function on the adsorbate coverage as well as on the structural and morphological changes of the adsorption layer, involved by annealing at various temperatures, has been measured.
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