Abstract
We have studied the adsorption of atomic nitrogen on Ni(100) and Ni(111) upon exposure to very low energy (1–20 eV) N 2 + and N + ion beams. The amount of adsorbed N was measured by Auger electron spectroscopy. The adsorption rate for N + is nearly constant as a function of the incident energy, while the dissociative adsorption rate for N 2 + shows a strong incident energy dependence and a resonance-like feature is observed at incident energies of 2–3 eV on Ni(100) and ~ 4 eV on Ni(111). The results for N 2 + can be explained by two channels: one is from electronically excited molecules, N 2 ∗, generated by resonance neutralization, and the other is from the ground state N 2. The resonance-like feature, which is structure-sensitive, can be explained by the deexcitation of N 2 ∗ correlated to the N-adsorbed structure on Ni(100) and Ni(111).
Published Version
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