Abstract

Plasma polymerization and aerosol-through-plasma (A-T-P) systems is a versatile technique for the deposition of plasma polymer films with functional properties suitable for a wide range of applications such as electronic and optical devices, coatings, and display materials1. However, plasma polymerization is mostly performed at vacuum plasmas, limiting its application to batch processes. In addition, in low pressure plasma technique, vacuum pumping systems are costly and require routine maintenance. This has motivated the development of novel atmospheric pressure plasma device to simplify the experimental operations and to reduce the apparatus cost and the process time2. The main technical issue for the atmospheric pressure plasma technique is low plasma density. Therefore, it is very important to increase the plasma density during plasma polymerization. In this study, we have proposed the intense plasma cloud type atmospheric pressure plasma jets (iPC-APPJ) device to enhance the plasma density in passive regions during plasma polymerization process2. The deposited plasma polymers by using iPC-APPJ device reveal the excellent plasma polymerization and matched with the spectrum of poly pyrrole. Furthermore, the selected area electron diffraction (SAED) pattern of plasma-polymerized pyrrole (pPPY) nanoparticle reveals the clear diffraction spot of the single crystalline characteristics and will be discussed in detail.

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