Abstract
The resist adhesion property of PECVD deposited hexamethyldisiloxane (HMDSO) films and related footing issues at the resist/BARC interface are evaluated. Larger work of adhesion between HMDSO films and photoresists and smaller stresses of coated HMDSO films are shown with higher O 2/HMDSO flow rate ratios. The adhesion property of HMDSO films is significantly enhanced by applying O 2 plasma treatment. No footing is found in resist profiles, which is consistent with the measurement result of thermal desorbing.
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