Abstract
TiO2 films were deposited by DC pulsed magnetron sputtering. XRD results showed that all annealed TiO2 films belonged to the single-phase anatase structure. There were different degrees of dominant anatase (001) facet in annealed TiO2 films. Based on various results, it could be found that an auxiliary cooling treatment provided to the substrate during film deposition, would make annealed TiO2 films (that do not have the dominant) have dominant anatase (001) facet. TEM was measured to analyze the structure change of TiO2 films. The formation mechanism of dominant anatase (001) facet was investigated systematically.
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