Abstract
TiO2 film was deposited onto polyimide substrate by DC pulsed magnetron sputtering with different sputtering power densities. XRD results showed that with increasing the sputtering power density from 0.83 W/cm2 to 5.00 W/cm2, the crystallinity of as-deposited TiO2 film improved monotonously. And 5.00 W/cm2 was determined as the critical sputtering power density in which the highest temperature the substrate could withstand. Then, XRD and TEM results showed that the as-deposited TiO2 film could have a better anatase structure by providing an auxiliary heating to the substrate at the highest temperature during TiO2 film deposition. Combining the sputtering parameters, as well as DC pulsed voltage waveform, the reason for as-deposited TiO2 film crystallization was investigated systematically.
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