A plasma resonance study of valley transfer in (001) Si inversion layers

Abstract

We observed the two-dimensional plasmons of the two-component electron plasma in the (001) Si-inversion layer resulting from simultaneous population of the [001] valley, E0, and the [010] valley, E0′, subbands under a compressional uniaxial stress along [010]. Our data show an onset of electron transfer from E0 to E0′ at X = (1.4 ± 0.1) kbar for n = 1.67 × 1012 cm−2 and X = (1.2 ± 0.2) kbar for n = 2.60 × 1012 cm−2, consistent with the theory of Takada and Ando that includes the electron-electron correlation effects.