Abstract
In this paper, the impact of extra electron source (EES) and dual metal gate engineering on conventional charge plasma TFET (CP-TFET) have been done for improving DC and analog/RF parameters. CP-TFET structure is upgraded to double source CP-TFET (DS-CP-TFET) by placing an EES below the source/channel junction for enhancing the device performance in terms of driving current and RF figures of merit (FOMs). But, in spite of these pros, the approach is having cons of higher leakage current similar to MOSFET and negative conductance (inherent nature of TFET). Both the issues have been resolved in the double source dual gate CP-TFET (DS-DG-CP-TFET) by gate workfunction engineering and drain underlapping respectively. Additionally, for getting the optimum performance of DS-DG-CP-TFET, the device sensitivity has been investigated in terms of position of EES, length of drain electrode and workfunction of gate electrode 1 (GE1).
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