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Abstract
Novel polysiloxanes containing sulfonyl side groups with high dielectric permittivity by thiol–ene post-polymerization reactions are presented.
Highlights
Polysiloxanes have a backbone composed of oxygen and silicon atoms that carry two organic substituents.[1]
We have shown that the thiol–ene reaction is efficient for the synthesis of polysiloxanes containing polar sulfonyl side groups
The content of sulfonyl groups was tuned by using different ratios of functional thiols 3 or 9 to butanethiol
Summary
Polysiloxanes can carry reactive groups such as hydrosilane or vinyl which allow for the introduction of functional groups via post-polymerization modifications.[4]. Phases were dried over MgSO4, filtered and the solvent was removed under reduced pressure to obtain 5 as a yellowish liquid (106.2 g, 0.960 mol, 88%). The combined organic layers were dried over MgSO4, filtered and the solvent was removed under reduced pressure to obtain a yellowish liquid, which was negative in a peroxide test. To a solution of methyl vinyl sulfone (47.71 g, 449 mmol, 1 eq.) and thioacetic acid (41.35 g, 543 mmol, 1.2 eq.) in THF (550 ml), Et3N (54.51 g, 539 mmol, 1.2 eq.) was added dropwise at room temperature and allowed to stir for 2 h. Hydrochloric acid (2 mol l−1, 270 ml, 540 mmol, 1.2 eq.) was added to the reaction mixture and the solution was extracted with CH2Cl2 (5 × 200 ml).
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