A complete resistance extraction methodology and circuit models for typical TSV structures

Abstract

Through-silicon via (TSV) is one of the key technologies on three-dimensional integration packaging. In this article, an experimental methodology with circuit models was proposed for electrical characteristic tests on typical TSV structures. To this end, self-developed test patterns such as the via chains, the snake interconnections and the Kelvin structures with different dimensions were designed and manufactured. Suitable electrical measurement methodologies were next employed to characterise the element behaviours of the patterns. Based on the experimental data, electrical circuit models for the TSV structures were introduced and the parameters of the model were exacted. The validity and accuracy of the electrical model were finally verified and the TSV characteristic measurements can be performed through a simpler process.