Abstract
The optical properties of thin dielectric films prepared by vacuum deposition and r.f. sputtering have been measured using guided waves, ellipsometry and reflectometry to assess the relative merits and disadvantages of the three techniques. Particular attention has been given to the effect on these measurements of typical film imperfections, for example refractive index inhomogeneity and anisotropy. The guided wave technique is shown to possess the highest precision of measurement, to be relatively insensitive to film inhomogeneity and to provide the most suitable method for studying film birefringence. Ellipsometry has a high sensitivity of measurement that can be usefully applied to thinner films than those required by the other techniques. The method is well suited for studying inhomogeneity, but because of its sensitivity to this film defect, ellipsometric measurements must always be interpreted with care. Reflectometry, although only of limited accuracy in measuring film properties, is widely applicable and provides values that, in general, are not seriously affected by inhomogeneity.
Published Version
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