Abstract
A compact 2.45 GHz electron cyclotron resonance (ECR) ion source has been developed as an etching device for diffusion experiments in the solid-state matter. This source is a little bit different from those of a usual industrial ECR device, i.e., it is to extract high intensity beams from a relatively small single hole with low emittance under the extraction voltage of several kV and high vacuum. Summary of the design, manufacture, and the initial beam extraction tests are described.
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