Abstract
A 64Mb SRAM macro is fabricated in a 32nm high-k metal-gate (HKMG) SOI technology [1]. Figure 14.1.1 shows the 0.154μm2 bitcell (BC). A 2× size reduction from the previous 45nm design [2] is enabled by an equal 2× reduction in BC area. No corner rounding of BC gates allows tighter overlay of gate electrode and active area. The introduction of HKMG provides a significant reduction in the equivalent oxide thickness, thereby reducing the Vt mismatch. This reduction allows aggressive scaling of device dimensions needed to achieve the small area footprint. A 0.7V VDD MIN operation is enabled by three assist features. Stability is improved by a bitline (BL) regulation scheme. Enhancements to the write path include an increase of 40% of BL boost voltage. Finally, a BC-tracking delay circuit improves both performance and yield across the process space.
Published Version
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