Abstract
The development of high-power pulsed lasers, with their ability to produce dense, hot plasmas, has provided the field of vacuum ultraviolet (VUV) spectroscopy with a new source of short-wavelength radiation. The characteristics of this source are radically different from conventional sources used for UV spectroscopy. As opposed to electron-driven plasma sources, laser plasmas are pulsed, usually produced by the output of lasers having a duration of several nanoseconds or less. They are point sources, usually having spatial extents of less than a millimeter, that are precisely located in a vacuum chamber, allowing easy access and precision alignment to optical instrumentation. Like discharge devices, their spectrum is rich in line emission, which can be easily varied by manipulation of the laser-plasma irradiation conditions. One of their principal drawbacks has been the generation of target debris, high-velocity projectiles of minute solid particles, or aerosol of the target material emanating from the plasma that causes the damage or destruction of delicate optical elements.
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