Abstract
Usefulness of BaCO_3,CaCO_3,ZnO and Mica abrasive is found for super-smooth mechanochemical polishing of large size silicon wafers. Machining characteristics of these abrasives depend on material quality of the polishing plates and polishing conditions. This paper describes comparison of polishing performances of these 4 mechanochemical abrasives. These results would be very useful as the fundamental data for determining optimum polishing conditions required for machining needs like improvement of flatness, smoothness and machining efficiency.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: The Proceedings of The Manufacturing & Machine Tool Conference
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
