Abstract
A 3‐dimensional (3D) computational fluid dynamics (CFD) simulation study on the effect of temperature and carrier‐gas flow rate on the deposition of photocatalytic titanium dioxide (TiO2) nanoparticles by metal‐organic (MO)CVD is presented. The model predicts the temperature, velocity, mass fraction of reactants and products, kinetic rate of reaction, and surface deposition rate profiles. Increasing temperature and reducing carrier gas flow rate increases the deposition rate and hence the amount of nanoparticles produced. Unlike carrier‐gas flow rate, temperature is significant in determining the rate of surface deposition. Simulation results are validated by experiments whenever possible due to limited data. Decent agreement between experiment and simulation supports the reliability of the simulation.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
