15 - Large Refractive Index C-S-Au Composite Film Formation by Plasma Processes

Abstract

Optical interconnection between large-scale integrated circuits is significant to minimize the time lag of signal transportation in the interconnection circuits. A new approach has been introduced which uses a high-index contrast optical wave-guide and a photonic crystal wave-guide to minimize the optical system. The high-index contrast optical wave-guide is a conventional optical wave-guide, but the refractive index of wave-guide must be large as possible as it can be formed to minimize the curvature. The light propagation loss increases with increasing the refractive index and decreasing a curvature radius. It is supposed that the photonic crystal overcomes the difficulty. The photonic crystal wave-guide can be realized according to the Photonic Band Gap (PBG) in the periodicity of refractive index material. Large refractive index and optically transparent materials are necessary for a photonic crystal fabrication. Widely using materials are GaAs and SiO2. Presently, fabricated photonic crystals are usually using air clad because the high refractive index materials have not good process compatibility and also there are few materials to fulfill high refractive index contrast. This chapter presents a paper that reports C-S-Au composite film formation and discusses the optical properties and processes for 2-Dimensional Photonic Crystal (2-D PC) fabrication.