Abstract
Atomic layer deposition (ALD) is gaining traction in the semiconductor industry due to its ability to meet the demands of high aspect ratios and densities. This is attributed to its excellent step coverage and uniformity, which are based on the self-limiting deposition process. Its applications have expanded to include various components such as memory device capacitors, gate oxides, metal barriers, and charge transport channels. Moreover, ALD is being explored for diverse purposes not only within the semiconductor field but also in displays and optoelectronics. This review aims to explore the versatility of ALD deposition methods, widely utilized in the semiconductor industry, and their potential applications in the display and optoelectronics sectors. Additionally, we present future prospects for ALD applications in display based on current approaches.
Published Version
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