Abstract
二重管式同軸線路マイクロ波プラズマCVD法によるa‐Si:H薄膜の基板温度特性
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https://doi.org/10.1541/ieejfms1972.106.391
Copy DOIPublication Date: Jan 1, 1986 | |
License type: free |
二重管式同軸線路マイクロ波プラズマCVD法によるa‐Si:H薄膜の基板温度特性
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